A study of etch rates of quartz using reactive ion etching
Keywords
Plasma etching, Quartz, Semiconductors -- Etching
Notes
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Graduation Date
1999
Semester
Fall
Advisor
Richie, Samuel M.
Degree
Master of Science (M.S.)
College
College of Engineering
Department
Electrical and Computer Engineering
Format
Language
English
Length of Campus-only Access
None
Access Status
Masters Thesis (Open Access)
Subjects
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
STARS Citation
Khan, Masoodur Rahman, "A study of etch rates of quartz using reactive ion etching" (1999). Retrospective Theses and Dissertations. 2167.
https://stars.library.ucf.edu/rtd/2167