Intense capillary discharge plasma extreme-ultraviolet sources for EUV lithography and other EUV imaging applications
Keywords
Optical coatings, Photolithography
Notes
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Graduation Date
1998
Semester
Summer
Advisor
Silfvast, William T.
Degree
Doctor of Philosophy (Ph.D.)
College
College of Engineering
Department
Electrical and Computer Engineering
Degree Program
Optical Science and Engineering
Format
Language
English
Length of Campus-only Access
None
Access Status
Doctoral Dissertation (Open Access)
Subjects
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
STARS Citation
Klosner, Marc A., "Intense capillary discharge plasma extreme-ultraviolet sources for EUV lithography and other EUV imaging applications" (1998). Retrospective Theses and Dissertations. 2437.
https://stars.library.ucf.edu/rtd/2437