Intense capillary discharge plasma extreme-ultraviolet sources for EUV lithography and other EUV imaging applications
Optical coatings, Photolithography
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Silfvast, William T.
Doctor of Philosophy (Ph.D.)
College of Engineering
Electrical and Computer Engineering
Optical Science and Engineering
Length of Campus-only Access
Doctoral Dissertation (Open Access)
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
Klosner, Marc A., "Intense capillary discharge plasma extreme-ultraviolet sources for EUV lithography and other EUV imaging applications" (1998). Retrospective Theses and Dissertations. 2437.