Use of tub compensation implants to improve the speed and breakdown characteristics of sub-micron CMOS technologies
Keywords
Metal oxide semiconductors, Complementary
Notes
This item is only available in print in the UCF Libraries. If this is your thesis or dissertation, you can help us make it available online for use by researchers around the world by STARS for more information.
Graduation Date
1998
Semester
Summer
Advisor
Sundaram, Kalpathy
Degree
Master of Science (M.S.)
College
College of Engineering
Department
Electrical and Computer Engineering
Format
Language
English
Length of Campus-only Access
None
Access Status
Masters Thesis (Open Access)
Subjects
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
STARS Citation
Vaidya, Hem M., "Use of tub compensation implants to improve the speed and breakdown characteristics of sub-micron CMOS technologies" (1998). Retrospective Theses and Dissertations. 2570.
https://stars.library.ucf.edu/rtd/2570