Use of tub compensation implants to improve the speed and breakdown characteristics of sub-micron CMOS technologies
Metal oxide semiconductors, Complementary
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Master of Science (M.S.)
College of Engineering
Electrical and Computer Engineering
Length of Campus-only Access
Masters Thesis (Open Access)
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
Vaidya, Hem M., "Use of tub compensation implants to improve the speed and breakdown characteristics of sub-micron CMOS technologies" (1998). Retrospective Theses and Dissertations. 2570.