Chemical vapor deposition of diamond thin films on a silicon substrate using a hot filament

Abstract

In this thesis, the chemical vapor deposition (CVD) of diamond and diamond like thin films using a thermal excitation mechanism (heated tungsten filament) is studied. The conditions for optimal growth and film morphology are investigated and discussed. The results and analysis of both scanning electron microscope and micro Raman spectroscopic surface studies are presented and discussed.

Notes

This item is only available in print in the UCF Libraries. If this is your thesis or dissertation, you can help us make it available online for use by researchers around the world by STARS for more information.

Graduation Date

1992

Semester

Spring

Advisor

Littlewood, Ian

Degree

Master of Science (M.S.)

College

College of Arts and Sciences

Department

Physics

Format

PDF

Pages

67 p.

Language

English

Length of Campus-only Access

None

Access Status

Masters Thesis (Open Access)

Identifier

DP0029857

Subjects

Arts and Sciences -- Dissertations, Academic; Dissertations, Academic -- Arts and Sciences

This document is currently not available here.

Share

COinS
 

Accessibility Statement

This item was created or digitized prior to April 24, 2026, or is a reproduction of legacy media created before that date. It is preserved in its original, unmodified state specifically for research, reference, or historical recordkeeping. In accordance with the ADA Title II Final Rule, the University Libraries provides accessible versions of archival materials upon request. To request an accommodation for this item, please submit an accessibility request form.