Study of defects associated with implantation of high dose vanadium and chromium into (100) single crystal silicon
Keywords
Chromium; Ion implantation; Silicon; Vanadium
Notes
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Graduation Date
Summer 2003
Advisor
Suryanarayana, C.
Degree
Master of Science (M.S.)
College
College of Engineering
Department
Mechanical, Materials, and Aerospace Engineering
Degree Program
Materials Science and Engineering
Format
Pages
94 p.
Language
English
Length of Campus-only Access
None
Access Status
Masters Thesis (Open Access)
Subjects
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
STARS Citation
Neelakantan, Rajesh, "Study of defects associated with implantation of high dose vanadium and chromium into (100) single crystal silicon" (2003). Retrospective Theses and Dissertations. 950.
https://stars.library.ucf.edu/rtd/950