Title

Recent Progress In Optical Coating Technology: Low Voltage Ion Plating Deposition

Abstract

After fairly extensive discussions of the advantages and disadvantages of low energy and high energy ion beam bombardment of a growing film, we review briefly a number of experimental results obtained with various samples made with low voltage reactive ion plating deposition. The availability of a state-of-the-art high vacuum coating machine specifically equipped for this process is the foundation for a major leap toward achieving near-perfect optical coatings. The high density of ion plated thin films makes them impermeable to water vapor and corrosive solutions. This has been demonstrated with protected aluminum mirrors, polarizers, and infrared anti-reflection coatings. An indication of the high packing density is the substantially higher refractive index than that of comparable layers deposited with either conventional electron beam evaporation or ion assisted deposition.

Publication Date

1-1-1990

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

1270

Number of Pages

211-221

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.20378

Socpus ID

0025594312 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0025594312

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