Title
Infrared Reflection Polarizers Using Uniform And Diffuse Low-Index Layers Buried In High-Index Substrates
Abstract
The extinction ratio ER and the reflectance, or throughput, for the unextinguished s polarization Rs are calculated for infrared reflection polarizers that consist of a low-index transparent layer embedded in a high-index transparent substrate. Iso-ER and iso-Rs contours illustrate the dependence of the ER and Rs for a specific IR polarizer on the depth and width of a buried layer of SiO2 in Si at 3.5-μm wavelength and 80° angle of incidence. Both cases of a uniform layer with sharp boundaries and a diffuse Gaussian layer are considered. The diffuse-layer model employs Bruggeman's effective medium theory and is intended to simulate devices that are fabricated by the oxygen-ion implantation of Si. The angular and wavelength sensitivities of these polarizers are determined.
Publication Date
8-16-1996
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
2873
Number of Pages
148-151
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.246204
Copyright Status
Unknown
Socpus ID
85075913494 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/85075913494
STARS Citation
Azzam, R. M.A. and Howlader, M. M.K., "Infrared Reflection Polarizers Using Uniform And Diffuse Low-Index Layers Buried In High-Index Substrates" (1996). Scopus Export 1990s. 2534.
https://stars.library.ucf.edu/scopus1990/2534