Title
Comments on "on the base profile design and optimization of epitaxial si- and sige-base bipolar technology for 77 k applications - part ii: circuit performance issues"
Abstract
The base transit time of the trapezoidal Ge base profile for the SiGe bipolar transistor has been evaluated. The analytical equations derived in the above paper1 result in significant error as the trapezoid profile is close to uniform Ge profile. In this work accurate analytical equations are derived. Comparisons between the present analytical predictions and previous published results are given. © 1997 IEEE.
Publication Date
12-1-1997
Publication Title
IEEE Transactions on Electron Devices
Volume
44
Issue
5
Number of Pages
915-917
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/16.568062
Copyright Status
Unknown
Socpus ID
0031145996 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0031145996
STARS Citation
Song, J., "Comments on "on the base profile design and optimization of epitaxial si- and sige-base bipolar technology for 77 k applications - part ii: circuit performance issues"" (1997). Scopus Export 1990s. 3149.
https://stars.library.ucf.edu/scopus1990/3149