Title

Emission Spectroscopy Of Reactive Low-Voltage Ion Plating For Metal-Oxide Thin Films

Abstract

Excited species in the plasma present during reactive low-voltage ion plating (RLVIP) of refractory oxide films are studied by using emission spectroscopy. We believe we have found a higher ratio of atomic to molecular oxygen then reported for earlier analyses that employed a quadrupole mass spectrometer. The application of emission spectroscopy to the RLVIP process and self-actinometry are discussed with examples of stable and unstable processes. © 1993 Optical Society of America.

Publication Date

1-1-1993

Publication Title

Applied Optics

Volume

32

Issue

28

Number of Pages

5606-5611

Document Type

Article

Identifier

scopus

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/AO.32.005606

Socpus ID

0027684950 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0027684950

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