Title
Droplet Laser Plasma Sources Of Euv Radiation
Abstract
An overview is given of the progress in the studies on a tin material limited-mass target which has demonstrated so far in-band conversion efficiencies in the range of ∼2%. The overall perspective of the developments required for laser plasmas to meet the requirements of the ITRS roadmap for EUV is outlined.
Publication Date
12-9-2003
Publication Title
Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume
1
Number of Pages
222-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
Copyright Status
Unknown
Socpus ID
0345328147 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0345328147
STARS Citation
Richardson, Martin, "Droplet Laser Plasma Sources Of Euv Radiation" (2003). Scopus Export 2000s. 1323.
https://stars.library.ucf.edu/scopus2000/1323
COinS