Title
High Conversion Efficiency Tin Material Laser Plasma Source For Euvl
Keywords
EUV lithography; EUV source; Laser plasma; Mass-limited source
Abstract
One of the key leverage factors in determining the viability of laser-plasma sources for EUVL is the conversion efficiency of laser light to EUV emission in the 13-nm region. We describe experiments and theoretical calculations on a mass-limited laser target design using tin that offers high conversion efficiency.
Publication Date
10-1-2003
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
5037 II
Number of Pages
801-806
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.504572
Copyright Status
Unknown
Socpus ID
0141724659 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0141724659
STARS Citation
Koay, C. S.; Keyser, C.; and Takenoshita, K., "High Conversion Efficiency Tin Material Laser Plasma Source For Euvl" (2003). Scopus Export 2000s. 1579.
https://stars.library.ucf.edu/scopus2000/1579