Title
Additive Lithography For Refractive Micro-Optics
Keywords
Beam shaping; Diffractive Optical Element (DOE); Lithography; Photoresist; Refractive optics
Abstract
An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in Integrated Circuit manufacturing and can be applied to thick and thin photoresists. The additive concept is centered on the idea of using multiple exposures to remove the desired amount of resist without resorting to multiple etching steps. This presentation will explain how the additive technique, used with thin and thick resists, will revolutionize our capability to efficiently form refractive lenses and micro-optics for optical beam shaping and transforming. The quality and reproducibility of these elements will also be discussed.
Publication Date
5-26-2003
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
4984
Number of Pages
1-9
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.477839
Copyright Status
Unknown
Socpus ID
0038734202 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0038734202
STARS Citation
Pitchumani, Mahesh; Hockel, Heidi; and Brown, Jeremiah, "Additive Lithography For Refractive Micro-Optics" (2003). Scopus Export 2000s. 1756.
https://stars.library.ucf.edu/scopus2000/1756