Title

Additive Lithography For Refractive Micro-Optics

Keywords

Beam shaping; Diffractive Optical Element (DOE); Lithography; Photoresist; Refractive optics

Abstract

An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in Integrated Circuit manufacturing and can be applied to thick and thin photoresists. The additive concept is centered on the idea of using multiple exposures to remove the desired amount of resist without resorting to multiple etching steps. This presentation will explain how the additive technique, used with thin and thick resists, will revolutionize our capability to efficiently form refractive lenses and micro-optics for optical beam shaping and transforming. The quality and reproducibility of these elements will also be discussed.

Publication Date

5-26-2003

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

4984

Number of Pages

1-9

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.477839

Socpus ID

0038734202 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0038734202

This document is currently not available here.

Share

COinS