Title
Ultrafast X-Ray Measurement Of Laser Heating In Semiconductors: Parameters Determining The Melting Threshold
Abstract
The pulse-width dependence of thermal melting and ablation thresholds in germanium and gallium arsenide is correlated to direct, ultrafast x-ray measurements of laser-heated depths. The heating dynamics, determined by the interplay of nonlinear optical absorption, delayed Auger heating, and high-density carrier diffusion, explain the scaling laws of thermal melting thresholds in different semiconductors. © 2001 The American Physical Society.
Publication Date
4-27-2001
Publication Title
Physical Review B - Condensed Matter and Materials Physics
Volume
63
Issue
19
Number of Pages
-
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1103/PhysRevB.63.193306
Copyright Status
Unknown
Socpus ID
0034907657 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0034907657
STARS Citation
Cavalleri, A.; Siders, C. W.; and Rose-Petruck, C., "Ultrafast X-Ray Measurement Of Laser Heating In Semiconductors: Parameters Determining The Melting Threshold" (2001). Scopus Export 2000s. 261.
https://stars.library.ucf.edu/scopus2000/261