Title
New Approach For Defining The Threshold Voltage Of Mosfets
Abstract
The threshold voltage of MOSFETs has traditionally been defined as the gate voltage required to cause the surface potential to be equal to twice the Fermi potential in the bulk of semiconductor. Such a definition, although widely used for modeling long-channel MOSFET's, becomes increasingly questionable for modern devices with diminishing channel lengths. In this paper a new approach is proposed which defines the threshold voltage based on the intersection of the two asymptotes of the surface potential for the depletion and strong inversion regions. The approach is tested in simulation environment for MOS devices having different channel lengths, oxide thicknesses, and substrate doping concentrations.
Publication Date
4-1-2001
Publication Title
IEEE Transactions on Electron Devices
Volume
48
Issue
4
Number of Pages
809-813
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/16.915731
Copyright Status
Unknown
Socpus ID
0035308164 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0035308164
STARS Citation
Salcedo, J. A.; Ortiz-Conde, A.; and García Sánchez, F. J., "New Approach For Defining The Threshold Voltage Of Mosfets" (2001). Scopus Export 2000s. 277.
https://stars.library.ucf.edu/scopus2000/277