Title

Liquid Droplet-Target Laser Plasma Sources For Euv Lithography

Abstract

Liquid droplet-target laser plasma sources were presented for extreme ultraviolet lithography. A target configuration with >2% conversion efficiency and an output power of >60 W, achievable with diode-pumped Nd:laser technology was reported. Plasma and radiation dynamics with particle, radiation, and optical diagnostics were measured. The laser plasma sources operated continuously at repetition rates of ∼5 kHz with a pulse-to-pulse stability better than 2%.

Publication Date

1-1-2002

Publication Title

Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

Number of Pages

441-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

Socpus ID

0036457678 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0036457678

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