Title

Dynamics Of Mass-Limited Laser Plasma Targets As Sources For Extreme Ultraviolet Lithography

Keywords

EUV lithography; Laser plasma; Water droplet target

Publication Date

1-1-2002

Publication Title

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volume

41

Issue

6 B

Number of Pages

4070-4073

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1143/jjap.41.4070

Socpus ID

0036614388 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0036614388

This document is currently not available here.

Share

COinS