Liquid Droplet-Target Laser Plasma Sources For Euv Lithography
Liquid droplet-target laser plasma sources were presented for extreme ultraviolet lithography. A target configuration with >2% conversion efficiency and an output power of >60 W, achievable with diode-pumped Nd:laser technology was reported. Plasma and radiation dynamics with particle, radiation, and optical diagnostics were measured. The laser plasma sources operated continuously at repetition rates of ∼5 kHz with a pulse-to-pulse stability better than 2%.
Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
Number of Pages
Article; Proceedings Paper
Source API URL
Keyser, C.; Koay, C. S.; and Bernath, R., "Liquid Droplet-Target Laser Plasma Sources For Euv Lithography" (2002). Scopus Export 2000s. 2888.