Title

Dynamics Of High-Repetition-Rate Laser Plasma Extreme Ultraviolet Sources From Droplet Targets

Keywords

EUV lithography; Interferometry; Laser plasma; Pulse slicer; Water droplet target

Abstract

As a mass limited target the water droplet laser plasma source has been shown to have many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray applications. Through a dual experimental and theoretical study, we analyze the interaction physics between the laser light and the target. The hydrodynamic laser plasma simulation code, Medusa103 is used to model the electron density distribution for comparison to electron density distributions obtained through Abel inversion of plasma interferograms. In addition, flat field EUV spectra are compared to synthetic spectra calculated with the atomic physics code RATION.

Publication Date

1-1-2002

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

4760

Issue

I

Number of Pages

454-462

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.482117

Socpus ID

0036442831 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0036442831

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