Title
Efficient 13.5 Nm Euv Generation From A Laser Plasma
Abstract
We describe a source of 13.5 nm radiation, based on multi-kHz laser-plasmas created from tin-bearing micro-droplets that has a high probability of satisfying the requirements for EUVL, the next generation lithography for computer chip fabrication. © 2005 Optical Society of America.
Publication Date
10-31-2005
Publication Title
Quantum Electronics and Laser Science Conference (QELS)
Volume
3
Number of Pages
1947-1949
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
Copyright Status
Unknown
Socpus ID
27144492057 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/27144492057
STARS Citation
Richardson, M.; Koay, C. S.; and Takenoshita, K., "Efficient 13.5 Nm Euv Generation From A Laser Plasma" (2005). Scopus Export 2000s. 3620.
https://stars.library.ucf.edu/scopus2000/3620