Title
Diagnostics For Laser Plasma Euv Sources
Keywords
EUV diagnostics; EUV sources; Laser plasma
Abstract
A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the principal diagnostics of the EUV radiation that are now being utilized in the metrology, spectroscopy and imaging of these sources.
Publication Date
8-16-2005
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
5580
Number of Pages
434-442
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.597349
Copyright Status
Unknown
Socpus ID
23244451441 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/23244451441
STARS Citation
Richardson, M.; Koay, C. S.; and Takenoshita, K., "Diagnostics For Laser Plasma Euv Sources" (2005). Scopus Export 2000s. 3800.
https://stars.library.ucf.edu/scopus2000/3800