Title
Modeling The Formation Of Photonic Crystals By Holographic Lithography
Keywords
Bandgap; Holographic lithography; Interference lithography; Modeling; Photonic crystals; Simulation
Abstract
An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.
Publication Date
7-21-2005
Publication Title
Progress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume
5720
Number of Pages
18-26
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.601186
Copyright Status
Unknown
Socpus ID
21844456630 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/21844456630
STARS Citation
Rumpf, Raymond C. and Johnson, Eric G., "Modeling The Formation Of Photonic Crystals By Holographic Lithography" (2005). Scopus Export 2000s. 3855.
https://stars.library.ucf.edu/scopus2000/3855