Title

Near-Field Nano-Patterning Of 3D Structures

Abstract

A comprehensive and fully three-dimensional model was developed to simulate fabrication of structures formed by near-field nano-patterning. Simulations were compared to laboratory results for photonic crystals formed in a standard contact mask aligner under partiallycoherent light. © 2005 Optical Society of America.

Publication Date

1-1-2005

Publication Title

Optics InfoBase Conference Papers

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/fio.2005.fws2

Socpus ID

85088758240 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/85088758240

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