Title

Modeling Vapor Deposition Of Metal/Semiconductor-Polymer Nanocomposite

Keywords

Condensation; Nanostructure; Physical vapor deposition; Polymer

Abstract

A mathematical model is developed to describe the deposition of metal/semiconductor (M/SC) and monomer vapors at low temperature. An expression is proposed for the condensation coefficient of M/SC on the polymer surface, to represent the effect of temperature and polymer surface roughness. The nucleation of M/SC clusters strongly depends on the deposition rate and the temperature. However, their growth, size and final distribution depend on the monomer deposition rate and the subsequent polymerization process. High polymer deposition rate produces a particle distribution with a small mean size and a blunt shape in large size cluster. This prediction is in good agreement with the experimental data. © 2004 Published by Elsevier B.V.

Publication Date

4-1-2005

Publication Title

Thin Solid Films

Volume

476

Issue

1

Number of Pages

190-195

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/j.tsf.2004.09.062

Socpus ID

13844310754 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/13844310754

This document is currently not available here.

Share

COinS