Title
Rf Circuit Performance Degradation Due To Soft Breakdown And Hot-Carrier Effect In Deep-Submicrometer Cmos Technology
Keywords
CMOS; Constant voltage stress; Hot carriers; Low-noise amplifier; Power amplifier; Scattering parameters; Soft breakdown
Abstract
A systematic study of RF circuit performance degradation subject to oxide soft breakdown (SBD) and hot-carrier (HC) stress is presented in this paper. DC and RF characteristics before and after stress are extracted from the experimental data. The effects of SBD and lie stress on s-parameters, cutoff frequency, third-order interception point, and noise parameters are examined. The performance drifts of gain, noise figure, linearity, and input matching of the RF low-noise amplifier are demonstrated by SpectreRF simulation results based on measured device data.
Publication Date
1-1-2001
Publication Title
IEEE Transactions on Microwave Theory and Techniques
Volume
49
Issue
9
Number of Pages
1546-1551
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/22.942565
Copyright Status
Unknown
Socpus ID
0035444824 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0035444824
STARS Citation
Li, Qiang; Zhang, Jinlong; and Li, Wei, "Rf Circuit Performance Degradation Due To Soft Breakdown And Hot-Carrier Effect In Deep-Submicrometer Cmos Technology" (2001). Scopus Export 2000s. 492.
https://stars.library.ucf.edu/scopus2000/492