Title
Minority Electron Transport Anisotropy In P-Type AlXGa1-XN/Gan Superlattices
Keywords
Electron microscopy; Semiconductor materials; Superlattices
Abstract
The minority electron diffusion length, L, in Mg-doped molecular beam epitaxy (MBE) grown p-type AlxGa1-xN/GaN superlattices with aluminum content x = 0.1 and 0.2 was measured perpendicular and parallel to the superlattice planes by the electron beam induced current (EBIC) technique. A large anisotropy in the transport properties was observed with the effect varying from 1:3 to 1:6. We attribute an experimentally observed diffusion length anisotropy to minority electron scattering during transport across the potential barriers of the superlattice. Reference p-GaN samples were also investigated, and the diffusion length was observed to be isotropic in both metal-organic chemical vapor deposition (MOCVD) (L = 0.5 μm) and MBE (L = 0.27 μm) grown samples.
Publication Date
1-1-2001
Publication Title
IEEE Transactions on Electron Devices
Volume
48
Issue
3
Number of Pages
433-437
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/16.906432
Copyright Status
Unknown
Socpus ID
0035278798 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0035278798
STARS Citation
Chernyak, Leonid; Osinsky, Andrei; and Fuflyigin, Vladimir N., "Minority Electron Transport Anisotropy In P-Type AlXGa1-XN/Gan Superlattices" (2001). Scopus Export 2000s. 511.
https://stars.library.ucf.edu/scopus2000/511