Title

Laser Plasma Euvl Sources - Progress And Challenges

Abstract

The most pressing technical issue for the success of EUV lithography is the provision of a high repetition-rate source having sufficient brightness, lifetime, and with sufficiently low off-band heating and particulate emissions characteristics to be technically and economically viable. We review current laser plasma approaches and achievements, with the objective of projecting future progress and identifying possible limitations and issues requiring further investigation.

Publication Date

8-18-2004

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

5374

Issue

PART 1

Number of Pages

447-453

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.541586

Socpus ID

3843051243 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/3843051243

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