Title
High Efficiency Tin-Based Euv Sources
Keywords
EUV lithography; EUV sources; Laser plasma; Mass-limited source
Abstract
We have previously proposed the use of mass-limited, tin-containing laser plasma sources for EUV lithography applications. Here we report advances in measurements of the spectral output, conversion efficiency, and debris emission from these sources. We also report progress in the use of repeller field debris inhibition techniques for this source.
Publication Date
5-3-2004
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
5196
Number of Pages
119-127
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.514083
Copyright Status
Unknown
Socpus ID
1942518270 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/1942518270
STARS Citation
Richardson, M.; Koay, C. S.; Keyser, C.; Takenoshita, K.; and Fujiwara, E., "High Efficiency Tin-Based Euv Sources" (2004). Scopus Export 2000s. 5469.
https://stars.library.ucf.edu/scopus2000/5469