Title

Analog Micro-Optics Fabrication By Use Of A Binary Phase Grating Mask

Keywords

Analog; Duty cycle; Micro-optics; Phase mask; Photolithography

Abstract

In this paper, we present a new photo-mask technology capable of forming a continuous relief micro-optic profile on thick photo-resist. This technique eliminates many of the drawbacks of gray-scale and half-tone masking technology. An optical stepper is used to fabricate binary phase gratings of pi phase depth on a transparent quartz reticle. When the phase reticle is used in the stepper an analog intensity profile is created on the wafer. The period is constrained allowing for control of the 0 th order in the stepper. The duty cycle of the phase gratings can be varied in such a way to provide the proper analog intensity profile for a wide range of micro-optics on the photo-resist. The design, analysis, and fabrication procedures of this technique will be discussed.

Publication Date

5-10-2004

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

5347

Number of Pages

62-70

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.522221

Socpus ID

2142733654 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/2142733654

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