Title

High Power Euvl Source Demonstration Of Tin-Doped Droplet Laser Plasma Generated By Industrial Solid State Lasers

Abstract

High EUV source power has been demonstrated with a laser-plasma source exhibiting low debris and high conversion efficiency. This offers a viable path towards successful realization of EUV lithography for the next generation semiconductor devices. © 2007 Optical Society of America.

Publication Date

12-1-2007

Publication Title

Conference on Lasers and Electro-Optics, 2007, CLEO 2007

Number of Pages

-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1109/CLEO.2007.4453741

Socpus ID

82955242478 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/82955242478

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