Title
Euv Sources For Lithography
Abstract
Pressed by the demands of the impending implementation of Extreme UV Lithography at the end of the decade, several competing EUV light source technologies vie to capture a billion dollar market. Here we review this exciting competition. ©2007 IEEE.
Publication Date
12-1-2007
Publication Title
Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Number of Pages
482-483
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/LEOS.2007.4382489
Copyright Status
Unknown
Socpus ID
51249104495 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/51249104495
STARS Citation
Richardson, Martin, "Euv Sources For Lithography" (2007). Scopus Export 2000s. 6088.
https://stars.library.ucf.edu/scopus2000/6088