Title
Tin Inventory For Hvm Euvl Sources
Keywords
Debris; Droplet plasma; EUV sources; Inventory
Abstract
Tin is one of the most efficient source materials for both gas discharge plasma sources and laser produced plasma sources for EUV lithography. Unlike Xenon which was the material commonly investigated for the EUVL source application, recycling of the target materials is not necessary for tin targets because of its low relative cost. However, in assessing the benefits of different source architectures, there are large differences in the size of the tin inventory used, and consequences that ensue. In this paper we make a first attempt to compare these differences, and assess their impact. Utilizing tin as the radiator at 13.5 nm reduces the total cost of the source system significantly.
Publication Date
10-15-2007
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
6517
Issue
PART 1
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.713463
Copyright Status
Unknown
Socpus ID
35148893141 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/35148893141
STARS Citation
Richardson, Martin C.; Takenoshita, Kazutoshi; and Schmid, Tobias, "Tin Inventory For Hvm Euvl Sources" (2007). Scopus Export 2000s. 6655.
https://stars.library.ucf.edu/scopus2000/6655