Title
Thin Film Deposition On Plastic Substrates Using Silicon Nanoparticles And Laser Nanoforming
Keywords
Laser nanoforming; Nanocrystalline silicon; Polycrystalline silicon; Raman spectroscopy; SEM
Abstract
Reduced melting temperature of nanoparticles is utilized to deposit thin polycrystalline silicon (c-Si) films on plastic substrates by using a laser beam without damaging the substrate. An aqueous dispersion of 5 nm silicon nanoparticles was used as precursor. A Nd:YAG (1064 nm wavelength) laser operating in continuous wave (CW) mode was used for thin film formation. Polycrystalline Si films were deposited on flexible as well as rigid plastic substrates in both air and argon ambients. The films were analyzed by optical microscopy for film formation, scanning electron microscopy (SEM) for microstructural features, energy dispersive spectroscopy (EDS) for impurities, X-ray photoelectron spectroscopy (XPS) for composition and bond information of the recrystallized film and Raman spectroscopy for estimating shift from amorphous to more crystalline phase. Raman spectroscopy showed a shift from amorphous to more crystalline phases with increasing both the laser power and irradiation time during laser recrystallization step. © 2006 Elsevier B.V. All rights reserved.
Publication Date
6-15-2006
Publication Title
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume
130
Issue
1-3
Number of Pages
228-236
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/j.mseb.2006.03.015
Copyright Status
Unknown
Socpus ID
33846397855 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/33846397855
STARS Citation
Bet, Sachin and Kar, Aravinda, "Thin Film Deposition On Plastic Substrates Using Silicon Nanoparticles And Laser Nanoforming" (2006). Scopus Export 2000s. 8318.
https://stars.library.ucf.edu/scopus2000/8318