Title
Thermal Evaporation Processing Of Nano And Submicron Tin Oxide Rods
Abstract
Nano and submicron rods of semiconductor tin oxide (SnO2) have been synthesized via thermal evaporation technique. Various substrates such as oxidized silicon (Si/SiO2), porous alumina (A12O 3), oxidized and anodized titanium (Ti/TiO2), with the sputtered platinum (Pt) catalyst, have been utilized for this purpose. The effect of Pt sputtering time and the nature of the substrate on the size distribution and the morphology of the SnO2 rods and their substrate-surface-coverage have been investigated. The formation of nano and submicron SnO2 rods has been attributed to the vapor-liquid-solid (VLS) and vapor-solid (VS) growth mechanisms depending on the processing conditions. © 2006 American Chemical Society.
Publication Date
6-15-2006
Publication Title
Journal of Physical Chemistry B
Volume
110
Issue
23
Number of Pages
11210-11216
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1021/jp061009b
Copyright Status
Unknown
Socpus ID
33745713467 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/33745713467
STARS Citation
Shukla, S.; Venkatachalapathy, V.; and Seal, S., "Thermal Evaporation Processing Of Nano And Submicron Tin Oxide Rods" (2006). Scopus Export 2000s. 8319.
https://stars.library.ucf.edu/scopus2000/8319