Title
On The Reliability Issues Of Rf Cmos Devices
Abstract
Although multi-finger MOS structures have demonstrated very attractive behaviors for high-frequency analog circuit applications, the shared drain and source regions for adjacent gate fingers have led to current crowding and results in the finger number-dependent current-voltage characteristics. In addition, the high current density spots near the drain region would deteriorate the MOS reliability in several aspects. Present results suggest that the common drain regions should be wider and more heavily doped in order to alleviate these effects. © 2006 IEEE.
Publication Date
1-1-2006
Publication Title
ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
Number of Pages
1105-1108
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/ICSICT.2006.306695
Copyright Status
Unknown
Socpus ID
34547334472 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/34547334472
STARS Citation
Wong, Hei; Fu, Yue; Liou, J. J.; Yue, Yun; and Iwai, Hiroshi, "On The Reliability Issues Of Rf Cmos Devices" (2006). Scopus Export 2000s. 9087.
https://stars.library.ucf.edu/scopus2000/9087