Title
Optical Characterization Of Bcn Films Deposited At Various N2/Ar Gas Flow Ratios By Rf Magnetron Sputtering
Keywords
Band gap; BCN; Optical properties; Sputtering
Abstract
We present the deposition and optical characterization of amorphous thin films of boron carbonitride (BCN). The BCN thin films were deposited in a radio frequency magnetron sputtering system using a B4C target. Films of different compositions were deposited by varying the ratio of argon and nitrogen gas in the sputtering ambient. X-ray photoelectron spectroscopy was used to perform surface characterization of the deposited films and a change in composition with nitrogen flow ratio was observed. The effect of gas flow ratios on the optical properties of the films was also investigated. It was found that the transmittance of the films increases with nitrogen incorporation. The optical band gap of the films ranged from 2.0 eV to 3.1 eV and increased with N2/Ar gas flow ratio except at the highest ratio. © 2011 Elsevier B.V. All rights reserved.
Publication Date
7-25-2011
Publication Title
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume
176
Issue
12
Number of Pages
878-882
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/j.mseb.2011.05.010
Copyright Status
Unknown
Socpus ID
79959688567 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/79959688567
STARS Citation
Todi, Vinit O.; Shantheyanda, Bojanna P.; Todi, Ravi M.; Sundaram, Kalpathy B.; and Coffey, Kevin, "Optical Characterization Of Bcn Films Deposited At Various N2/Ar Gas Flow Ratios By Rf Magnetron Sputtering" (2011). Scopus Export 2010-2014. 2618.
https://stars.library.ucf.edu/scopus2010/2618