Title
Laser-Based Plasma Sources At 6.6 And 60 Nm
Abstract
Potential high power laser-based xenon and terbium plasma sources are identified based on the reflectivity profiles of the available LaN/B4C, LaN/B, and Al/Yb/Sio multilayer mirrors for applications such as surface processing and semiconductor industry. © 2013 Optical Society of America.
Publication Date
11-18-2013
Publication Title
CLEO: Science and Innovations, CLEO_SI 2013
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
Copyright Status
Unknown
Socpus ID
84887553901 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84887553901
STARS Citation
Masnavi, Majid; Szilagyi, John; Parchamy, Homaira; and Richardson, Martin C., "Laser-Based Plasma Sources At 6.6 And 60 Nm" (2013). Scopus Export 2010-2014. 6471.
https://stars.library.ucf.edu/scopus2010/6471