Title
Laser-Based Plasma Sources At 6.6 And 60 Nm
Abstract
Potential high power laser-based xenon and terbium plasma sources are identified based on the reflectivity profiles of the available LaN/B4C, LaN/B, and Al/Yb/Sio multilayer mirrors for applications such as surface processing and semiconductor industry. © 2013 Optical Society of America.
Publication Date
1-1-2013
Publication Title
CLEO: QELS_Fundamental Science, CLEO:QELS FS 2013
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1364/cleo_at.2013.jw1d.2
Copyright Status
Unknown
Socpus ID
84887685982 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84887685982
STARS Citation
Masnavi, Majid; Szilagyi, John; Parchamy, Homaira; and Richardson, Martin C., "Laser-Based Plasma Sources At 6.6 And 60 Nm" (2013). Scopus Export 2010-2014. 7683.
https://stars.library.ucf.edu/scopus2010/7683