Title
Extremely Low-Loss Chalcogenide Photonics Devices With Chlorine-Based Plasma Etching
Keywords
Etching; Films; Glass; Optical ring resonators; Optical waveguides; Photonics; Propagation losses
Abstract
Chlorine-based plasma is employed to produce extremely low propagation loss as low as 0.42 dB/cm in chalcogenide waveguides, record-high intrinsic Q-factors of 450,000 microring resonators and fiber-to-waveguide grating couplers with a coupling efficiency of 37%.
Publication Date
8-10-2015
Publication Title
Conference on Lasers and Electro-Optics Europe - Technical Digest
Volume
2015-August
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
Copyright Status
Unknown
Socpus ID
84954069229 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84954069229
STARS Citation
Chiles, Jeff; Malinowski, Marcin; Rao, Ashutosh; Novak, Spencer; and Richardson, Kathleen, "Extremely Low-Loss Chalcogenide Photonics Devices With Chlorine-Based Plasma Etching" (2015). Scopus Export 2015-2019. 1520.
https://stars.library.ucf.edu/scopus2015/1520