Extremely Low-Loss Chalcogenide Photonics Devices With Chlorine-Based Plasma Etching

Abstract

Chlorine-based plasma is employed to produce extremely low propagation loss as low as 0.42 dB/cm in chalcogenide waveguides, record-high intrinsic Q-factors of 450,000 microring resonators and fiber-to-waveguide grating couplers with a coupling efficiency of 37%. © OSA 2015.

Publication Date

5-4-2015

Publication Title

CLEO: Science and Innovations, CLEO-SI 2015

Number of Pages

2267-

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/CLEO_SI.2015.STh1G.6

Socpus ID

84935432573 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84935432573

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