Title
Extremely Low-Loss Chalcogenide Photonics Devices With Chlorine-Based Plasma Etching
Abstract
Chlorine-based plasma is employed to produce extremely low propagation loss as low as 0.42 dB/cm in chalcogenide waveguides, record-high intrinsic Q-factors of 450,000 microring resonators and fiber-to-waveguide grating couplers with a coupling efficiency of 37%. © OSA 2015.
Publication Date
5-4-2015
Publication Title
CLEO: Science and Innovations, CLEO-SI 2015
Number of Pages
2267-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1364/CLEO_SI.2015.STh1G.6
Copyright Status
Unknown
Socpus ID
84935432573 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/84935432573
STARS Citation
Chiles, Jeff; Malinowski, Marcin; Rao, Ashutosh; Novak, Spencer; and Richardson, Kathleen, "Extremely Low-Loss Chalcogenide Photonics Devices With Chlorine-Based Plasma Etching" (2015). Scopus Export 2015-2019. 1884.
https://stars.library.ucf.edu/scopus2015/1884