Dependence Of Solar Cell Contact Resistivity Measurements On Sample Preparation Methods

Abstract

The measurement of contact resistivity between the grid metallization of a solar cell and the underlying silicon wafer is most conveniently performed by cutting strips from solar cells rather than fabricating dedicated structures with variable spaced contacts. We studied the effect of strip width on the measurements and found the lowest values in the range of 10-15 mm. We found laser scribing conditions whereby strips could be successfully isolated on the emitter side without snapping strips from the rest of the cell.

Publication Date

11-18-2016

Publication Title

Conference Record of the IEEE Photovoltaic Specialists Conference

Volume

2016-November

Number of Pages

3033-3036

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1109/PVSC.2016.7750221

Socpus ID

85003604090 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/85003604090

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