Design And Analysis Of Multilayered Waveguide Structure With Metal-Dielectric Gratings For Sensing With Reflection Narrowband Notch Filter

Keywords

Double-grating; Multilayered nanostructure; Notch filter; Reflected attenuation; Refractive index sensing

Abstract

Developments in micro and nanofabrication technologies have led a variety of grating waveguide structures (GWS) being proposed and implemented in optics and laser application systems. A new design of multilayered nanostructure double-grating is described for reflection notch filter. Thin metal film and dielectric film are used and designed with one-dimensional composite gratings. The results calculated by rigorous coupled-wave analysis (RCWA) present that the thin metal film between substrate and grating can produce significant attenuated reflections and efficiency in a broad reflected spectral range. The behavior of such a reflection filter is evaluated for refractive index sensing, which can be applied inside the integrated waveguide structure while succeeding cycles in measurement. The filter peaks are designed and obtained in a visible range with full width half maximum (FWHM) of several nanometers to less than one nanometer. The multilayered structure shows a sensitivity of refractive index of 220nm/RIU as changing the surroundings. The reflection spectra are studied under different periods, depths and duty cycles. The passive structure and its characteristics can achieve practical applications in various fields, such as optical sensing, color filtering, Raman spectroscopy and laser technology.

Publication Date

1-1-2015

Publication Title

Medziagotyra

Volume

21

Issue

4

Number of Pages

506-510

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.5755/j01.ms.21.4.9625

Socpus ID

84948965577 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84948965577

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