Keywords
Metal oxide semiconductors, Complementary, Power amplifiers
Abstract
This study investigated the Class F and inverse Class F RF power amplifier operating at 5.8 GHz. The major challenging issue in design and implementation of CMOS power transistor is the breakdown voltage especially in sub-micron CMOS technologies. In order to eliminate this problem a Cascode topologies were implemented to reduce the Drain-toSource voltage (stress). A Cascode Class F & Inverse Class F RF power amplifier were designed, and optimized in order to improve efficiency and reliability using 0.18µm CMOS technology process. A 50% decrease in the stress has been achieved in the Cascode class-F and Inverse class F amplifiers. The sensitivity and temperature effect were investigated using BSIM-4 model. Such an amplifier was designed and optimized for a good sensitivity. A substrate bias circuit was implemented to achieve a good sensitivity. Recommendations were made for future advancements for modification and optimization of the class F and inverse class F circuit by the application of other stress reduction strategies, and improvement of the substrate bias circuit for a better sensitivity.
Notes
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Graduation Date
2011
Semester
Summer
Advisor
Yuan, Jiann S.
Degree
Master of Science in Electrical Engineering (M.S.E.E.)
College
College of Engineering and Computer Science
Department
Electrical Engineering and Computer Science
Degree Program
Electrical Engineering
Format
application/pdf
Identifier
CFE0004030
URL
http://purl.fcla.edu/fcla/etd/CFE0004030
Language
English
Length of Campus-only Access
None
Access Status
Masters Thesis (Open Access)
Subjects
Dissertations, Academic -- Engineering and Computer Science, Engineering and Computer Science -- Dissertations, Academic
STARS Citation
Skaria, Giji, "Class F And Inverse Class F Power Amplifier Subject To Electrical Stress Effect" (2011). Electronic Theses and Dissertations. 1891.
https://stars.library.ucf.edu/etd/1891