Study of sputtered tantalum pentoxide and aluminum oxide thin films and their multistacks for embedded capacitor applications

Keywords

Aluminum oxide; Capacitors; Sputtering (Physics); Tantalum; Thin films

Notes

This item is only available in print in the UCF Libraries. If this is your thesis or dissertation, you can help us make it available online for use by researchers around the world by downloading and filling out the Internet Distribution Consent Agreement. You may also contact the project coordinator Kerri Bottorff for more information.

Graduation Date

2003

Advisor

Sundaram, Kalpathy B.

Degree

Master of Science (M.S.)

College

College of Engineering

Department

Electrical Engineering and Computer Science

Format

Print

Pages

78 p.

Language

English

Length of Campus-only Access

None

Access Status

Masters Thesis (Open Access)

Subjects

Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic

This document is currently not available here.

Share

COinS