The application of response surface and robust design methods to semiconductor process and device simulation

Abstract

This thesis describes the application of response surface methods and robust design methods to the simulation of a CMOS semiconductor process and devices. The problem addressed involves five processing input variables, four process noise variables and four responses. In the use of robust design method, it is shown how a scoring function can be utilized to assist in the selection of an optimum operating point. The robust design application selects an operating point based on centering the.process mean and minimizing the sensitivity of the process to variability in the process. Both methods are shown to provide satisfactory results.

Notes

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Graduation Date

1991

Semester

Fall

Advisor

Liou, Juin J.

Degree

Master of Science (M.S.)

College

College of Engineering

Department

Electrical Engineering

Format

PDF

Pages

114 p.

Language

English

Length of Campus-only Access

None

Access Status

Masters Thesis (Open Access)

Identifier

DP0029064

Subjects

Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic

Accessibility Status

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