Instrumented nanoindentation studies of chemical mechanical planarization (CMP) pads
Keywords
Grinding and polishing; Nanotechnology; Oliver Pharr method; Semiconductors -- Surfaces
Notes
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Graduation Date
2003
Advisor
Sundaram, Kalpathy B.
Degree
Master of Science (M.S.)
College
College of Engineering
Department
Electrical Engineering and Computer Science
Format
Pages
88 p.
Language
English
Length of Campus-only Access
None
Access Status
Masters Thesis (Open Access)
Subjects
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
STARS Citation
Dakshinamurthy, Surendramohan, "Instrumented nanoindentation studies of chemical mechanical planarization (CMP) pads" (2003). Retrospective Theses and Dissertations. 802.
https://stars.library.ucf.edu/rtd/802
Accessibility Statement
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