Instrumented nanoindentation studies of chemical mechanical planarization (CMP) pads

Keywords

Grinding and polishing; Nanotechnology; Oliver Pharr method; Semiconductors -- Surfaces

Notes

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Graduation Date

2003

Advisor

Sundaram, Kalpathy B.

Degree

Master of Science (M.S.)

College

College of Engineering

Department

Electrical Engineering and Computer Science

Format

Print

Pages

88 p.

Language

English

Length of Campus-only Access

None

Access Status

Masters Thesis (Open Access)

Subjects

Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic

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