Instrumented nanoindentation studies of chemical mechanical planarization (CMP) pads
Grinding and polishing; Nanotechnology; Oliver Pharr method; Semiconductors -- Surfaces
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Sundaram, Kalpathy B.
Master of Science (M.S.)
College of Engineering
Electrical Engineering and Computer Science
Length of Campus-only Access
Masters Thesis (Open Access)
Dissertations, Academic -- Engineering; Engineering -- Dissertations, Academic
Dakshinamurthy, Surendramohan, "Instrumented nanoindentation studies of chemical mechanical planarization (CMP) pads" (2003). Retrospective Theses and Dissertations. 802.