Title

Characterization and optimization of zinc oxide films by r.f. magnetron sputtering

Keywords

Deposition processes; Sputtering; Zinc oxide

Abstract

Zinc oxide films were deposited by a r.f. magnetron sputtering using a zinc oxide target. The deposited films were characterized as a function of deposition temperature, pressure, argon-oxygen gas flow ratio, target-substrate distance. The deposition conditions were optimized to give good quality films suitable for the fabrication of surface acoustic wave device. The films deposited at temperatures as low as 250 °C yielded surface acoustic wave device quality. © 1997 Elsevier Science S.A. All rights reserved.

Publication Date

2-28-1997

Publication Title

Thin Solid Films

Volume

295

Issue

1-2

Number of Pages

87-91

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/S0040-6090(96)09274-7

Socpus ID

0031074701 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0031074701

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