Title
Reliability Investigation Of Ingap/Gaas Hbts Under Current And Temperature Stress
Abstract
The reliability of InGaP/GaAs N-p-n heterojunction bipolar transistors (HBTs) with different base metal contact systems (Au/Zn/Au, Ti/Au, Ti/Pt/Au and the novel Ti/ZrB2/Au) under current and temperature stress is studied in this paper. We further report results of current stress on three p-GaAs doping impurities namely Zn, Be and C. The effect of O+/H- and O+/He+ ions, used in the fabrication of planar self-aligned HBTs, is also investigated in the stability of device dc current gain. The instability phenomena typical of each factors and their effects on the HBT characteristics are reported. © 1999 Elsevier Science Ltd. All rights reserved.
Publication Date
12-17-1999
Publication Title
Microelectronics Reliability
Volume
39
Issue
12
Number of Pages
1809-1816
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/S0026-2714(99)00189-4
Copyright Status
Unknown
Socpus ID
6544271508 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/6544271508
STARS Citation
Rezazadeh, A. A.; Bashar, S. A.; and Sheng, H., "Reliability Investigation Of Ingap/Gaas Hbts Under Current And Temperature Stress" (1999). Scopus Export 1990s. 4279.
https://stars.library.ucf.edu/scopus1990/4279